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Characterisation of molybdenum intermediate layers in Cu-C system with SIMS methodMAYERHOFER, K. E; SCHRANK, C; EISENMENGER-SITTNER, C et al.Applied surface science. 2005, Vol 252, Num 1, pp 266-270, issn 0169-4332, 5 p.Conference Paper

Fabrication of nested elliptical KB mirrors using profile coating for synchrotron radiation X-ray focusingCHIAN LIU; ICE, G. E; LIU, W et al.Applied surface science. 2012, Vol 258, Num 6, pp 2181-2185, issn 0169-4332, 5 p.Conference Paper

Ion beam sputter deposition of epitaxial Ag films on native oxide covered Si(100) substratesKHARE, C; GERLACH, J. W; PATZIG, C et al.Applied surface science. 2012, Vol 258, Num 24, pp 9617-9622, issn 0169-4332, 6 p.Article

Coating of Ti-6Al-4V alloy with pure titanium film by sputter-deposition for improving biocompatibilitySONODA, T; SAITO, T; WATAZU, A et al.Surface and interface analysis. 2006, Vol 38, Num 4, pp 797-800, issn 0142-2421, 4 p.Conference Paper

Tailoring phase and oxidation states of Cu by varying oxygen gas flow rates in rf sputter deposition for photovoltaic devicesLIM, Kyounga; PARK, Juyun; RAMSIER, Rex D et al.Applied surface science. 2012, Vol 258, Num 8, pp 4097-4099, issn 0169-4332, 3 p.Article

SEM/EDS study of metal-assisted oxide desorptionHOPF, T; MARKWITZ, A.Surface science. 2010, Vol 604, Num 17-18, pp 1531-1535, issn 0039-6028, 5 p.Article

Crystallization kinetics of amorphous SiC films : Influence of substrateSCHMIDT, H; FOTSING, E. R; BORCHARDT, G et al.Applied surface science. 2005, Vol 252, Num 5, pp 1460-1470, issn 0169-4332, 11 p.Article

Thermal stability of magnetron sputtered amorphous Si2CGUSTUS, R; GRUBER, W; WEGEWITZ, L et al.Applied surface science. 2012, Vol 258, Num 15, pp 5567-5573, issn 0169-4332, 7 p.Article

Metallization of grafted silicon surfaces : Sputtering-related damage effectsDI VITA, Edoardo; NARDUCCI, Dario.Surface science. 2007, Vol 601, Num 13, pp 2855-2858, issn 0039-6028, 4 p.Conference Paper

Room temperature surface passivation of silicon for screen printed c-Si solar cells by HiTUS reactive sputter depositionKAMINSKI, P. M; BASS, K; CLAUDIO, G et al.Applied surface science. 2014, Vol 301, pp 51-55, issn 0169-4332, 5 p.Conference Paper

Optimum compositions for the low-temperature fabrication of highly ordered FePt (001) and FePt (110) filmsSEKI, Takeshi; SHIMA, Toshiyuki; TAKANASHI, Koki et al.IEEE transactions on magnetics. 2004, Vol 40, Num 4, pp 2522-2524, issn 0018-9464, 3 p., 2Conference Paper

Improved thermoelectric performance of a film device induced by densely columnar Cu electrodeMING TAN; YUAN DENG; YANMING HAO et al.Energy (Oxford). 2014, Vol 70, pp 143-148, issn 0360-5442, 6 p.Article

Recollections of fifty years with splutteringSIGMUND, Peter.Thin solid films. 2012, Vol 520, Num 19, pp 6031-6049, issn 0040-6090, 19 p.Article

High temperature degradation behavior of sputtered nanostructured Co-Al coatings on superalloyRAHMAN, Atikur; JAYAGANTHAN, R; CHANDRA, Ramesh et al.Applied surface science. 2013, Vol 265, pp 10-23, issn 0169-4332, 14 p.Article

The influence of the substrate nature on the iron repartition in the titania matrixIACOMI, Felicia; MARDARE, Diana; GRECU, Maria N et al.Surface science. 2007, Vol 601, Num 13, pp 2692-2695, issn 0039-6028, 4 p.Conference Paper

Time-resolved in situ investigations of reactive sputtering processes by grazing incidence X-ray absorption spectroscopyLÜTZENKIRCHEN-HECHT, Dirk; FRAHM, Ronald.Surface science. 2006, Vol 600, Num 18, pp 4380-4384, issn 0039-6028, 5 p.Conference Paper

Visible photocurrent response of TiO2 anodeGORZKOWSKA-SOBAS, A; KUSIOR, E; RADECKA, M et al.Surface science. 2006, Vol 600, Num 18, pp 3964-3970, issn 0039-6028, 7 p.Conference Paper

Hydrogenation of Pd capped Mg thin films at room temperatureYOSHIMURA, Kazuki; YAMADA, Yasusei; OKADA, Masaharu et al.Surface science. 2004, Vol 566-68, pp 751-754, issn 0039-6028, 4 p., 2Conference Paper

Plasmonic cyclohexane-sensing by sputter-deposited Au nanoparticle array on SiO2KAWAGUCHI, Kazuhiro; YAMAMOTO, Shunya; YOSHIKAWA, Masahito et al.Thin solid films. 2014, Vol 562, pp 648-652, issn 0040-6090, 5 p.Article

Stress tuning in sputter-deposited MoOx filmsFAOU, J.-Y; BARTHEL, E; GRACHEV, S. Y et al.Thin solid films. 2013, Vol 527, pp 222-226, issn 0040-6090, 5 p.Article

c-axis orientation and piezoelectric coefficients of AlN thin films sputter-deposited on titanium bottom electrodesABABNEH, A; ALSUMADY, M; SEIDEL, H et al.Applied surface science. 2012, Vol 259, pp 59-65, issn 0169-4332, 7 p.Article

Combinatorial masked deposition: simple method to control deposition flux and its spatial distributionNODA, Suguru; KAJIKAWA, Yuya; KOMIYAMA, Hiroshi et al.Applied surface science. 2004, Vol 225, Num 1-4, pp 372-379, issn 0169-4332, 8 p.Article

Stress induced texture and shape memory trench in TiNiCu filmsFU, Y. Q; HUANG, W. M; DU, Hj et al.Thin solid films. 2011, Vol 519, Num 15, pp 5290-5296, issn 0040-6090, 7 p.Conference Paper

Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter depositionSEO, H; HWANG, H; HOWE, B et al.Thin solid films. 2010, Vol 518, Num 18, pp 5169-5172, issn 0040-6090, 4 p.Article

Change in the chemical and electronic properties of TiO2/SnO2:F stacked-layers induced by the photocatalytic reactionOKADA, Masahisa; YAMADA, Yasusei; YOSHIMURA, Kazuki et al.Surface science. 2006, Vol 600, Num 18, pp 4385-4389, issn 0039-6028, 5 p.Conference Paper

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